Nikon Eclipse L200N / L200ND

Incorporating CFI60 optics for flawless inspection of 200mm wafers and masks

L200

Offers 200mm wafer and mask inspection capabilities for reflected light illumination defect identification with various observation methods such as brightfield, darkfield, simple polarizing and DIC.

L200ND

Offers 200mm wafer and mask inspection capabilities for both transmitted and relfected light illumination. In addition to the observation methods of the L200N, epi-fluorescence observations including 365nm UV exicitation is possible.

L200A

Automated version of the L200N. Frequently used operations such as aperture control, focusing, brightfield/darkfield changeover, nosepiece rotation, lamp intensity control, and DIC settings are all motorized and can be controlled by the remote controller or a PC.